Plenary Lectures
The chemistry of etching and deposition processes
R. d'Agostino, F. Fracassi and R. Lamendola
p. 1185 [full text - pdf 592 kB]
Mass and optical emission spectroscopy of plasmas for diamond synthesis
C. Benndorf, P. Joeris and R. Kroger
p. 1195 [full text - pdf 708 kB]
Atoms, radicals and ions observed in plasmas - Their gas and surface chemistry
G. Hancock, L. Lanyi, J. P. Sucksmith and B. K. Woodcock
p. 1207 [full text - pdf 468 kB]
Review of plasma development in the former Soviet Union
O. I. Yas'ko
p. 1215 [full text - pdf 620 kB]
The future of thermal plasma processing for coating
T. Yoshida
p. 1223 [full text - pdf 600 kB]
Topical Lectures
Section: Thermal Plasmas
Plasma fluidized and spouted bed reactors: An overview
G. Flamant
p. 1231 [full text - pdf 472 kB]
High temperature processing and numerical modelling of thermal plasmas in Norway
J. A. Bakken
p. 1239 [full text - pdf 491 kB]
Plasma spraying: Present and future
P. Fauchais and M. Vardelle
p. 1247 [full text - pdf 969 kB]
Diagnostic techniques for plasma reactor temperature and species determination in advanced materials processing
W. C. Roman and J. C. Hermanson
p. 1259 [full text - pdf 621 kB]
Theoretical basis of non-equilibrium near atmospheric pressure plasma chemistry
A. A. Fridman and V. D. Rusanov
p. 1267 [full text - pdf 652 kB]
Modelling of dielectric barrier discharge chemistry
B. Eliasson, W. Egli and U. Kogelschatz
p. 1275 [full text - pdf 1286 kB]
Theory of electric corona including the role of plasma chemistry
J. J. Lowke and R. Morrow
p. 1287 [full text - pdf 642 kB]
High power plasma arc melting process for incinerated ash contraction
K. Kinoshita, A. Hayashi, K. Akahide and T. Yamazaki
p. 1295 [full text - pdf 445 kB]
Gliding arc: Applications to engineering and environment control
A. Czernichowski
p. 1301 [full text - pdf 1157 kB]
Section: Low Pressure Plasmas
The reactive sputtering of oxides and nitrides
R. P. Howson
p. 1311 [full text - pdf 466 kB]
Nucleation, growth, and morphology of dust in plasmas
A. Garscadden
p. 1319 [full text - pdf 1593 kB]
Electron cyclotron resonance plasma etching of Si with Cl2: Plasma chemistry and mechanisms
K. Ono, M. Tuda, H. Ootera and T. Oomori
p. 1327 [full text - pdf 1081 kB]
Plasma processing techniques used at Caswell
D. A. Tossell, M. C. Costello, A. P. Webb and K. C. Vanner
p. 1335 [full text - pdf 2372 kB]
Processing of electronic materials by microwave plasma
M. R. Wertheimer and M. Moisan
p. 1343 [full text - pdf 845 kB]
Decomposition of gaseous dielectrics (CF4,SF6) by a non-equilibrium plasma. Mechanisms, kinetics, mass spectrometric studies and interactions with polymeric targets
Y. Khairallah, F. Khonsari-Arefi and J. Amouroux
p. 1353 [full text - pdf 667 kB]
Self consistent low pressure RF (radiant flux) discharge modelling: Comparisons with experiments in clean and dusty plasmas
Ph. Belenguer and J. P. Boeuf
p. 1363 [full text - pdf 2777 kB]
Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers
P. Favia, R. d'Agostino and F. Fracassi
p. 1373 [full text - pdf 535 kB]
Real-time monitoring of surface chemistry during plasma processing
E. S. Aydil, R. A. Gottscho and Y. J. Chabal
p. 1381 [full text - pdf 619 kB]
The fullerenes: Precursors for 21st century materials
A. G. Avent, P. R. Birkett, C. Christides, J. D. Crane, A. D. Darwish, P. B. Hitchcock, M. W. Kroto, M. F. Meidine, K. Prassides, R. Taylor and D. R. M. Walton
p. 1389 [full text - pdf 570 kB]
Plasmaphysical and plasmachemical aspects of diamond deposition in low pressure plasmas
A. Ohl
p. 1397 [full text - pdf 591 kB]
IUPAC Recommendations on Nomenclature and Symbols and Technical Reports from Commissions
Properties of ethylene-dimethylaminoethylmethacrylate copolymers as poly(vinyl chloride) resin modifier (Technical Report)
Commission on Polymer Characterization and Properties
S. C. Kim, B. S. Jin, T. Ohmae, T. Masuda and A. Nakajima
p. 1405 [full text - pdf 1530 kB]
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